FYSS5455 Electron, Photon and Ion Beam Methods in Materials Science (5 cr)
- Interaction of energetic ions, electrons and photons with matter
- thin film deposition techniques
- ion, electron and photon beam based characterization techniques for thin films and surfaces
- project work, which consists of growth of thin films using atomic layer deposition, characterization of thin films using at least two different techniques, reporting performed analysis and presenting results in a seminar.
After passing the course successfully the student
knows the most used thin film deposition techniques and applications of thin films
knows the basic interactions between photons, electrons and ions with matter
knows the different physical properties which can be probed using electron, photon and ion beam techniques
understands the underlying physics of different techniques
is able to choose the right characterization technique for each materials problem
can evaluate the quality of the results from own measurements but also from other studies
has hands-on experience of thin film deposition and characterization
can critically compare results obtained from same physical parameter by two different techniques
is able to do independent analysis of ion beam analysis data including the uncertainty budget
can write a brief report and give a presentation based on measured and simulated experimental data
Description of prerequisites
Preferably basic knowledge of nuclear and materials physics.
Lecture slides, other material given during the course.
Teaching (5 cr)
Project work including sample preparation and analysis with at least two techniques
Lectures cover all the major materials characterization techniques in which photon, electron or ion beams are used