FYSS5455 Electron, Photon and Ion Beam Methods in Materials Science (5 cr)

• Interaction of energetic ions, electrons and photons with matter
• thin film deposition techniques
• ion, electron and photon beam based characterization techniques for thin films and surfaces
• project work, which consists of growth of thin films using atomic layer deposition, characterization of thin films using at least two different techniques, reporting performed analysis and presenting results in a seminar. 

After passing the course successfully the student

• knows the most used thin film deposition techniques and applications of thin films

• knows the basic interactions between photons, electrons and ions with matter

• knows the different physical properties which can be probed using electron, photon and ion beam techniques

• understands the underlying physics of different techniques

• is able to choose the right characterization technique for each materials problem

• can evaluate the quality of the results from own measurements but also from other studies

• has hands-on experience of thin film deposition and characterization

• can critically compare results obtained from same physical parameter by two different techniques

• is able to do independent analysis of ion beam analysis data including the uncertainty budget

• can write a brief report and give a presentation based on measured and simulated experimental data 

Preferably basic knowledge of nuclear and materials physics. 

Lecture slides, other material given during the course.