FYSS6335 Micro- and Nanofabrication (7 cr)
Study level:
Advanced studies
Grading scale:
0-5
Language:
English
Responsible organisation:
Department of Physics
Curriculum periods:
2017-2018, 2018-2019, 2019-2020
Description
Content
Development of the silicon planar process and lithography; thin films: Materials, general properties and characterization; deposition methods (Physical & chemical vapor deposition); etching methods (Dry, wet, plasma); doping methods (Diffusion & Ion implantation); nanoimprint lithography and self-assembly -based methods; state-of-the-art in microfabrication; the nanotechnology frontier
Completion methods
Examination, assignments, laboratory work
Assessment details
Active participation to the course events is expected. The final grade is based on examination (70 %), assignments (15 %) and laboratory work (15 %). To pass the course students need to have a final score of 50 %.
Learning outcomes
At the end of this course, students will be able to create a micro- or nanofabrication process from scratch and evaluate theoretically the outcome of different fabrication processes.
Additional information
Given on spring semester 2nd period, every two years starting spring 2018.
Description of prerequisites
Before enrolling for this course, students are expected to have studied the Experimental Methods in Physics (FYSA1110).
Study materials
Lecture notes, website(s), articles, etc.
Literature
- Sami Franssila, "Introduction to microfabrication", Wiley, 2004, ISBN: 978-0-470-85105-0; ISBN: 978-0-470-85105-0
- Brodie, Ivor, Muray, Julius J. "The Physics of Micro/Nano-Fabrication" Plenum 1993. ISBN: 978-0-306-44146-2; ISBN: 978-0-306-44146-2
- Marc J. Madou, "Fundamentals of Microfabrication: The Science of Miniaturization", CRC press, 2002. ISBN: 9780849308260; ISBN: 9780849308260
Completion methods
Method 1
Select all marked parts
Parts of the completion methods
x
Unpublished assessment item