FYSS6330 Microscopy and Lithography (7 cr)

Study level:
Advanced studies
Grading scale:
0-5
Language:
English
Responsible organisation:
Department of Physics
Curriculum periods:
2020-2021, 2021-2022, 2022-2023, 2023-2024

Description

  • Basic imaging science

  • optical-, electron-, ion-, and scanning probe microscopy

  • near-field optical microscopy

  • basics of micro- and nanolithography

  • Photolithography

  • electron and ion beam lithography

  • scanning probe lithography 

Learning outcomes

At the end of this course, students will be able to

  • select appropriate imaging method for different samples and conditions

  • understand the limitations in different microscopy methods

  • evaluate what lithography method is suitable for different patterning condition

Description of prerequisites

FYSP1050 Introduction to Electromagnetism or equivalent. 

Study materials

Lecture notes, website, articles, etc.

Literature

  • Eugene Hecht, “Optics” 5th Ed, Maddison-Wesley, 2002
  • Chris Mack, “Fundamental Principles of Optical Lithography”, Wiley

Completion methods

Method 1

Description:
Given every two years starting spring 2021.
Evaluation criteria:
Active participation is expected and group assignments are compulsory. Half of total points required for passing. The grade is based on examination (70 %), group assignments (15 %) and written assignments (15 %).
Time of teaching:
Period 4
Select all marked parts
Parts of the completion methods
x

Teaching (7 cr)

Type:
Participation in teaching
Grading scale:
0-5
Evaluation criteria:
Active participation is expected and group assignments are compulsory. Half of total points required for passing. The grade is based on examination (70 %), group assignments (15 %) and written assignments (15 %).
Language:
English
Study methods:

Lectures, group assignments, written assignments, examination. 

No published teaching