FYSS6336 Microfabrication (4 cr)

Study level:
Advanced studies
Grading scale:
0-5
Language:
English
Responsible organisation:
Department of Physics
Curriculum periods:
2024-2025, 2025-2026, 2026-2027, 2027-2028

Description

  • Development of the silicon planar process
  • thin films: Materials, general properties and characterization
  • deposition methods (Physical & chemical vapor deposition)
  • optical lithography
  • etching methods (Dry, wet, plasma)
  • doping methods (Diffusion & Ion implantation)
  • state-of-the-art in microfabrication

Learning outcomes

At the end of this course, students will be able to

  • create a microfabrication process from scratch

  • describe the chemical and physical processes in different microfabrication techniques

  • evaluate theoretically the outcome of different fabrication processes. 

Description of prerequisites

FYSA1110 Experimental Methods in Physics or similar. 

Study materials

Lecture notes, website, articles, etc.

Literature

  • Sami Franssila, "Introduction to microfabrication", Wiley, 2004, ISBN: 978-0-470-85105-0
  • Brodie, Ivor, Muray, Julius J. "The Physics of Micro/Nano-Fabrication" Plenum 1993. ISBN: 978-0-306-44146-2
  • Marc J. Madou, "Fundamentals of Microfabrication: The Science of Miniaturization", CRC press, 2002. ISBN: 9780849308260

Completion methods

Method 1

Evaluation criteria:
Active participation is expected. Half of total points required for passing. The grade is based on examination (70 %), assignments (15 %) and laboratory work (15 %).
Time of teaching:
Period 1
Select all marked parts
Parts of the completion methods
x

Participation in teaching (4 cr)

Type:
Participation in teaching
Grading scale:
0-5
Language:
English
No published teaching