FYSS6336 Microfabrication (4 cr)
Study level:
Advanced studies
Grading scale:
0-5
Language:
English
Responsible organisation:
Department of Physics
Curriculum periods:
2024-2025, 2025-2026, 2026-2027, 2027-2028
Description
- Development of the silicon planar process
- thin films: Materials, general properties and characterization
- deposition methods (Physical & chemical vapor deposition)
- optical lithography
- etching methods (Dry, wet, plasma)
- doping methods (Diffusion & Ion implantation)
- state-of-the-art in microfabrication
Learning outcomes
At the end of this course, students will be able to
create a microfabrication process from scratch
describe the chemical and physical processes in different microfabrication techniques
evaluate theoretically the outcome of different fabrication processes.
Description of prerequisites
FYSA1110 Experimental Methods in Physics or similar.
Study materials
Lecture notes, website, articles, etc.
Literature
- Sami Franssila, "Introduction to microfabrication", Wiley, 2004, ISBN: 978-0-470-85105-0
- Brodie, Ivor, Muray, Julius J. "The Physics of Micro/Nano-Fabrication" Plenum 1993. ISBN: 978-0-306-44146-2
- Marc J. Madou, "Fundamentals of Microfabrication: The Science of Miniaturization", CRC press, 2002. ISBN: 9780849308260
Completion methods
Method 1
Evaluation criteria:
Active participation is expected. Half of total points required for passing. The grade is based on examination (70 %), assignments (15 %) and laboratory work (15 %).
Time of teaching:
Period 1
Select all marked parts
Parts of the completion methods
x
Participation in teaching (4 cr)
Type:
Participation in teaching
Grading scale:
0-5
Language:
English