FYSS6330 Microscopy and Lithography (7 cr)
Study level:
Advanced studies
Grading scale:
0-5
Language:
English
Responsible organisation:
Department of Physics
Curriculum periods:
2020-2021, 2021-2022, 2022-2023, 2023-2024
Description
Basic imaging science
optical-, electron-, ion-, and scanning probe microscopy
near-field optical microscopy
basics of micro- and nanolithography
Photolithography
electron and ion beam lithography
scanning probe lithography
Learning outcomes
At the end of this course, students will be able to
select appropriate imaging method for different samples and conditions
understand the limitations in different microscopy methods
evaluate what lithography method is suitable for different patterning condition
Description of prerequisites
FYSP1050 Introduction to Electromagnetism or equivalent.
Study materials
Lecture notes, website, articles, etc.
Literature
- Eugene Hecht, “Optics” 5th Ed, Maddison-Wesley, 2002
- Chris Mack, “Fundamental Principles of Optical Lithography”, Wiley
Completion methods
Method 1
Description:
Given every two years starting spring 2021.
Evaluation criteria:
Active participation is expected and group assignments are compulsory. Half of total points required for passing. The grade is based on examination (70 %), group assignments (15 %) and written assignments (15 %).
Time of teaching:
Period 4
Select all marked parts
Parts of the completion methods
x
Teaching (7 cr)
Type:
Participation in teaching
Grading scale:
0-5
Evaluation criteria:
Active participation is expected and group assignments are compulsory. Half of total points required for passing. The grade is based on examination (70 %), group assignments (15 %) and written assignments (15 %).
Language:
English
Study methods:
Lectures, group assignments, written assignments, examination.