FYSS6330 Microscopy and Lithography (7 cr)
Study level:
Advanced studies
Grading scale:
0-5
Language:
English
Responsible organisation:
Department of Physics
Curriculum periods:
2017-2018, 2018-2019, 2019-2020
Description
Content
Basic imaging science; optical-, electron-, ion-, and scanning probe microscopy; near-field optical microscopy; basics of micro- and nanolithography; photolithography; electron and ion beam lithography; scanning probe lithography
Completion methods
Examination, assignments, written assignments
Assessment details
Active participation to the course events is expected. The final grade is based on examination (70 %), assignments (15 %) and written assignments (15 %). To pass the course students need to have a final score of 50 %.
Learning outcomes
At the end of this course, students will be able to select appropriate imaging method for different samples and conditions. They will also be able to evaluate what lithography method is suitable for different patterning conditions.
Additional information
Given on spring semester 2nd period, every two years starting spring 2019.
Description of prerequisites
Before enrolling for this course, students are expected to have studied the Introduction to Electromagnetism (FYSP1050)
Study materials
Lecture notes, website(s), articles, etc.
Literature
- Eugene Hecht, “Optics” 5th Ed, Maddison-Wesley, 2002
- Chris Mack, “Fundamental Principles of Optical Lithography”, Wiley
Completion methods
Method 1
Select all marked parts
Parts of the completion methods
x
Unpublished assessment item